CONFINED PLASMA for thin film deposition

The Plasma Coatings Group is a research group part of the Low Temperature Plasma Laboratory of the National Institute for Laser, Plasma and Radiation Physics in Bucharest, Romania.

We are specialised on deposition and characterization of metallic, semiconductor, ceramic and Diamond-Like Carbon (DLC) films for both research and industry, using original plasma sources based on the Thermoionic Vacuum Arc (TVA) plasma [PUBLICATIONS].

We can deposit thin and thick films (0.004 – 10) μm of any metal and non-metal in the Periodic Table, nitrides, oxides and also Diamond Like Carbon DLC, pure or in any combination of chemical elements. The deposition can be made on different substrate materials: metals, glass, ceramics, plastics etc, in a temperature range from room temperature up to 350°C, depending on the specific application.

We developed a large scale confined-plasma coating facility for advanced materials solutions.

For more details, please do not hesitate to contact us.

Our research is mainly sponsored by the Romanian Ministry of Research.

Last updated: 13.11.2023