Thin-film deposition services on large areas using an original plasma source: the APLA source (Atomic Precision Large Area)
INFLPR offers specialized services for ultra-uniform deposition of metals, Diamond-Like Carbon (DLC), nitrides, and oxides on large-size substrates, intended for the production of special optical components, battery electrodes, mechanical parts, etc.
1. Technology – introduction
The source used for this technology is the APLA (Atomic Precision Large Scale) plasma source, based on the vacuum thermionic arc (TVA), reconfigured with elements that provide reproducibility and control of the thickness and morphology of the deposited layers at the sub-nanometric level, achieved over large areas. The technology includes precise control of the plasma electrical parameters and their reproducibility.
Benefits compared to classical deposition methods:
The plasma plume is concentrated above the electrodes and does not flood the chamber. This makes it possible to deposit on any substrate, including temperature-sensitive materials. In contrast, Chemical Vapor Deposition (CVD) processes use high temperatures, above 300°C.
In addition, deposition takes place in high vacuum, without the need for a buffer gas. Thus, the resulting layers do not contain adsorbed gases and are more compact. Another important advantage is that the plasma is created through gentle processes that do not sputter the target material, resulting in smooth layers with nanometer-level roughness. Furthermore, plasma exposure is ultra-uniform over large areas, with uniformity deviations not exceeding 1 nm.
2. Services offered
a) Application of thin layers of metals, metal combinations, DLC, nitrides, and oxides on substrates made of various materials, whether conductive or non-conductive, including temperature-sensitive substrates.
b) Substrate surface preparation: cleaning, degreasing, and surface activation.
c) Development stages: direct prototype or customized process.
d) Testing and quality assurance: adhesion, thickness measurements, roughness, and layer composition.
e) Consulting and technical support: for selecting suitable materials and deposition processes for a specific application.